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 Control of contaminants is a critical factor that may contribute significantly to both device performance and wafer yield. As wafer sizes have grown and linewidths have decreased, devices have become sensitive to lower levels of impurities.
The ITRS device roadmap specifies parts-per-billion gas purity for bulk gases used in front end process steps for silicon devices. The PureGuard catalytic, heated getter and HP Series palladium purifiers offer a range of choices for all flow rates in the most advanced submicron silicon fabs.
Typical Gases: All bulk gases
Flow Rates: Range of flows from 1 to 300 slpm
Suggested Purifiers:
PureGuard catalytic or heated getter and HP Series palladium purifiers
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